NanoFrazor – a versatile technology for 2D and 3D nano structuring, Philip Paul (SwissLitho AG)
Date: 27 November 2018 Time: 11:00 - 12:00
The NanoFrazor is a versatile lithography method for creating nanostructures to a resolution down to 10 nm. The core principle utilises an ultra-sharp, heatable AFM tip, which locally evaporates a special thermal resist polymer. This technology was developed at the IBM Zurich Research Labs and is commercialized by SwissLitho. It is a growing community with currently more than 15 machines installed at research facilities worldwide.
Compared to the standard methods, the NanoFrazor principle has some unique advantages, namely the operation in ambient conditions (not vacuum), lack of beam or charged particle damage, the simple in-situ overlay alignment, the immediate quality control without development step, and the 3D patterning capability.
The applications range from creating high-resolution plasmonic structures, to optical structures, e.g. blazed gratings and 3D holograms and phase plates, to nano-bio applications where the heated probe is used directly to e.g. activate cross-linking chemistries.
As the same tip is used for patterning and imaging, extremely accurate overlay alignment to existing features can be realized, e.g. to individual nanowires or flakes of 2D-materials such as MoS2 or Graphene. These can be located through the resist, much reducing the preparation time. Imaging the written structures with the tip also enables a feedback loop to automatically adjust the patterning parameters, simplifying operation for the users.
Pattern transfer is compatible with standard clean room methods, e.g. reactive ion etching and lift-off techniques. SwissLitho collaborates closely with its customers to develop fabrication processes for challenging applications.
All are welcome!
|Location:||Nanoforce seminar room, Mile End Campus|
|Contact:||Thomas Iskratsch, PhD, Dipl.-Ing.|